When employing process simulation to generate a complex device structure, TCAD engineers often face the task of reproducing the exact etch profile that has been observed in semiconductor fabrication. Silvaco Victory Process offers several geometric models to efficiently achieve etch geometries that accurately match microscopy images (e.g., transmission electron microscopy). In this webinar, we present… Read More »Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory Process