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SPIE Advanced Lithography + Patterning
February 25 @ 8:00 am - February 29 @ 6:00 pm PST
Attend and hear research, challenges, and breakthroughs as you gather with colleagues in San Jose
Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Five days of exciting content and connecting with your community
- Plenary talks
- Technical presentations
- Networking sessions
- Course offerings
- Exhibition
Come to hear world-class speakers
Chan Hwang
Samsung (Korea)
Ann Kelleher
Intel Corp. (United States)
Todd Younkin
Semiconductor Research Corporation (USA)
Explore six great conferences
- Optical and EUV Nanolithography
- DTCO and Computational Patterning
- Metrology, Inspection, and Process Control
- Novel Patterning Technologies
- Advances in Patterning Materials and Processes
- Advanced Etch Technology and Process Integration for Nanopatterning