When employing process simulation to generate a complex device structure, TCAD engineers often face the task of reproducing the exact etch profile that has been observed in semiconductor fabrication. Silvaco Victory Process offers several geometric… Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory Process
The layout implementation of analog circuits in advanced FinFET technologies is becoming increasingly complex and challenging, with many new design rules to consider and multi-patterning, density rules, matching, and EM-IR concerns. These challenges can translate… Tackling Advanced Analog FinFET Back-End Design Challenges
Analog engineers adopting advanced FinFET technologies face many challenges that were not present when using planar transistors. Challenges in layout implementation have a direct impact on design specifications, and the luxury of over-margining is long… Tackling Advanced Analog FinFET Front-End Design Challenges with Better Methodologies
FinFET technologies have enabled designs with increased density and performance while reducing power, when compared to MOSFET. However, this comes at a cost of increased design complexity. Not only are some undesirable layout dependent effects… Managing the Complexity of FinFET Standard Cell Layout with Cello